Oxidation and Diffusion processes such as thermal oxidation and annealing are essential steps in semiconductor device fabrication. These processes often involve exposure to extreme temperatures, dry or wet oxygen atmospheres, and long process cycles in furnaces, diffusion ovens, or lamp annealing systems. These harsh conditions place severe stress on sealing materials, demanding exceptional thermal and chemical performance. The Katon® compounds in this catagory provide sealing solutions for high-temperature oxidation environments, ensuring well sealing integrity under continuous heat and oxygen exposure—minimizing risks in diffusion, annealing, and oxidation tools.
